Title :
Fabrication methods by which the intrinsic noise is reduced in Si and CZT nuclear radiation detectors
Author :
Hammig, Mark D. ; Jeong, Manhee
Author_Institution :
Dept. of Nucl. Eng. & Radiol. Sci., Univ. of Michigan, Ann Arbor, MI, USA
Abstract :
Silicon PIN-type diodes with active areas of 1 cm2 have been fabricated on n-type, high-resistivity (>;10kΩ-cm), 550 μm thick 4" Float-Zone (FZ) silicon substrates. In order to reduce the leakage-current density, optimized metal field-plate and multiple guard-ring structures were included in the electrode design. In addition, both phosphorus-doped polysilicon and amorphous silicon gettering resulted in n-type PIN diodes with room-temperature leakage currents lower than 10 nA at -100V reverse bias voltage. Several gamma-ray spectra, from isotopic sources 133Ba and 57Co, were acquired when the PIN-type detector was connected to various preamplifiers from Ortec, Amptek and Endicott Interconnect Technologies, Inc. (EITI). The eV-5093 produced the best noise performance, yielding a full width at half maximum (FWHM) energy resolution of 4.7% at 122 keV and 1.88 % at 356 keV. Gettering methods by which the resolution is improved further are demonstrated.
Keywords :
current density; electrical resistivity; gamma-ray detection; getters; leakage currents; nuclear electronics; p-i-n diodes; silicon radiation detectors; 133Ba isotopic source; 57Co isotopic source; Amptek interconnect technologies; CZT nuclear radiation detector; Endicott interconnect technologies; Ortec interconnect technologies; amorphous silicon gettering method; fabrication method; float-zone silicon substrates; gamma-ray spectra; leakage-current density; multiple guard-ring structure; n-type PIN diodes; n-type high-resistivity analysis; noise performance analysis; phosphorus-doped polysilicon analysis; reverse bias voltage; silicon PIN-type diodes; size 550 mum; voltage -100 V; Detectors; Gold; Image resolution; Materials; Preamplifiers; Security; Signal resolution;
Conference_Titel :
Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC), 2011 IEEE
Conference_Location :
Valencia
Print_ISBN :
978-1-4673-0118-3
DOI :
10.1109/NSSMIC.2011.6154518