Title :
RTP uniformity improvement through simulation
Author :
Tanasa, Corina ; Ranish, Joe ; Hunter, Aaron ; Ramamurthy, Sundar ; Jallepally, Ravi ; Ramachandran, Balasubramanian ; Lai, Claudia ; Tjandra, Agus ; Tam, Norman
Author_Institution :
Appl. Mater. Inc., Sunnyvale, CA
Abstract :
Some RTP chamber non-uniformity is due to the lamp arrangement geometry. An internally written simulation program was written to reproduce this non-uniformity. The results of the simulation were successfully tested against experimental results. The simulation then lead to finding lamp types and lamp combination recipes which decrease overall non-uniformity in the RTP chamber by 40%
Keywords :
rapid thermal processing; semiconductor process modelling; RTP uniformity improvement; internally written simulation program; lamp arrangement geometry; lamp combination recipes; Collimators; Geometry; Lamps; Radio access networks; Semiconductor device modeling; Temperature; Testing;
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. 12th IEEE International Conference on
Conference_Location :
Portland, OR
Print_ISBN :
0-7803-8477-6
DOI :
10.1109/RTP.2004.1441962
