DocumentCode :
3354833
Title :
Modeling of SOI based photonic crystals for far IR applications
Author :
Chandrasekaran, Arvind ; Packirisamy, Muthukumaran ; Nerguizian, Vahé
Author_Institution :
Dept. of Mech. & Ind. Eng., Concordia Univ.
Volume :
4
fYear :
2006
fDate :
9-13 July 2006
Firstpage :
3387
Lastpage :
3390
Abstract :
Photonic crystals devices are defined as periodic arrangement of the dielectric structures which allow propagation of only certain electromagnetic wave modes in the band gaps. In this work, SOI based photonic crystals have been modeled for far infrared (FIR) applications. The fabrication of photonic crystals has been carried out with the SOI MicraGeM process technology. The finite element modeling (FEM) of the photonic crystal waveguiding in FIR has been carried out and the results are presented
Keywords :
finite element analysis; infrared spectra; photonic crystals; silicon-on-insulator; FEM; MicraGeM process technology; SOI; dielectric structures; electromagnetic wave modes; far IR applications; far infrared; finite element modeling; periodic arrangement; photonic crystal waveguiding; photonic crystals devices; Finite impulse response filter; Optical device fabrication; Optical scattering; Optical waveguides; Periodic structures; Photonic band gap; Photonic crystals; Resonance light scattering; Silicon on insulator technology; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industrial Electronics, 2006 IEEE International Symposium on
Conference_Location :
Montreal, Que.
Print_ISBN :
1-4244-0496-7
Electronic_ISBN :
1-4244-0497-5
Type :
conf
DOI :
10.1109/ISIE.2006.296010
Filename :
4078938
Link To Document :
بازگشت