DocumentCode
3355025
Title
3-D simulation on current density distribution in flip-chip solder joints with thick Cu UBM under current stressing
Author
Liang, S.W. ; Shao, T.L. ; Chen, Chih
Author_Institution
Dept. of Material Sci. & Eng., National Chiao Tung Univ., Hsin-chu
fYear
2005
fDate
May 31 2005-June 3 2005
Firstpage
1416
Lastpage
1420
Abstract
In flip-chip solder joints, Cu has been used as a under-bump metallization (UBM) for its excellent wettability with solders. In addition, electromigration has become a crucial reliability concerns for fine-pitch flip chip solder joints. In this paper, 3D finite element method was employed to simulate the current density distribution for the eutectic SnPb solder joints with 5 mum, 10 mum, and 20 mum thick Cu UBM. It was found that the thicker the UBM is, the lower the maximum current density inside the solder. The maximum current density decreased from 4.37 times 104 A/cm2 to 7.54 times 103 A/cm2 when the thickness of the UBM changed from 5 mum to 20 mum. Thicker Cu UBM can effectively relieve the current crowding effect inside the solder
Keywords
copper; current density; current distribution; electromigration; eutectic alloys; fine-pitch technology; finite element analysis; flip-chip devices; lead alloys; metallisation; reliability; solders; tin alloys; wetting; 10 micron; 20 micron; 3D finite element method; 3D simulation; 5 micron; Cu; SnPb; current crowding effect; current density distribution; current stressing; electromigration; eutectic solder joint; fine-pitch solder joint; flip-chip solder joint; thick Cu UBM; underbump metallization; wettability; Current density; Electromigration; Finite element methods; Flip chip solder joints; Metallization; Packaging; Proximity effect; Soldering; Substrates; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2005. Proceedings. 55th
Conference_Location
Lake Buena Vista, FL
ISSN
0569-5503
Print_ISBN
0-7803-8907-7
Type
conf
DOI
10.1109/ECTC.2005.1441971
Filename
1441971
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