Title :
DUV lasers applied to semiconductor inspection and optical disk mastering
Author :
Kubota, S. ; Eguchi, N. ; Masuda, H.
Author_Institution :
Sony Corp., Tokyo, Japan
fDate :
July 30 2001-Aug. 1 2001
Abstract :
We report on all-solid-state, continuous-wave, deep-UV (DUV) lasers at 266 nm and even at sub-200 nm as driving force for wafer inspection and optical disk mastering.
Keywords :
inspection; laser beam applications; optical disc storage; optical fabrication; optical microscopy; photoresists; solid lasers; ultraviolet lithography; 266 nm; CCD camera; DUV lasers; DUV microscope; MTF; all-solid-state CW lasers; chemically amplified photoresist; defect classification; optical disk mastering; semiconductor inspection; wafer inspection; Adaptive optics; Inspection; Laser beam cutting; Laser modes; Light sources; Optical scattering; Resonance light scattering; Ring lasers; Scanning electron microscopy; Semiconductor lasers;
Conference_Titel :
Advanced Semiconductor Lasers and Applications/Ultraviolet and Blue Lasers and Their Applications/Ultralong Haul DWDM Transmission and Networking/WDM Components, 2001. Digest of the LEOS Summer Topica
Conference_Location :
Copper Mountain, CO, USA
Print_ISBN :
0-7803-7100-3
DOI :
10.1109/LEOSST.2001.941918
