Title :
Implications of electron attachment to highly-excited states in pulsed-power discharges
Author :
Pinnaduwage, Lal A.
Author_Institution :
Oak Ridge Nat. Lab., TN, USA
fDate :
June 29 1997-July 2 1997
Abstract :
We point out the possible implications of electron attachment to highly-excited states of molecules in two pulsed power technologies. One involves the pulsed H/sub 2/ discharges used for the generation of H/sup -/ ion beams for magnetic fusion energy and particle accelerators. The other is the power modulated plasma discharges used for material processing.
Keywords :
discharges (electric); electron attachment; excited states; fusion reactors; ion beams; particle accelerators; plasma applications; pulsed power technology; H/sup -/ ion beams generation; electron attachment; highly-excited states; magnetic fusion energy; material processing; molecules; particle accelerators; power modulated plasma discharges; pulsed H/sub 2/ discharges; pulsed-power discharges; Contamination; Electrons; Etching; Fault location; Fusion power generation; Plasma applications; Plasma density; Plasma materials processing; Pulse generation; Radio frequency;
Conference_Titel :
Pulsed Power Conference, 1997. Digest of Technical Papers. 1997 11th IEEE International
Conference_Location :
Baltimore, MA, USA
Print_ISBN :
0-7803-4213-5
DOI :
10.1109/PPC.1997.674534
