DocumentCode
3357522
Title
Implications of electron attachment to highly-excited states in pulsed-power discharges
Author
Pinnaduwage, Lal A.
Author_Institution
Oak Ridge Nat. Lab., TN, USA
Volume
2
fYear
1997
fDate
June 29 1997-July 2 1997
Firstpage
1048
Abstract
We point out the possible implications of electron attachment to highly-excited states of molecules in two pulsed power technologies. One involves the pulsed H/sub 2/ discharges used for the generation of H/sup -/ ion beams for magnetic fusion energy and particle accelerators. The other is the power modulated plasma discharges used for material processing.
Keywords
discharges (electric); electron attachment; excited states; fusion reactors; ion beams; particle accelerators; plasma applications; pulsed power technology; H/sup -/ ion beams generation; electron attachment; highly-excited states; magnetic fusion energy; material processing; molecules; particle accelerators; power modulated plasma discharges; pulsed H/sub 2/ discharges; pulsed-power discharges; Contamination; Electrons; Etching; Fault location; Fusion power generation; Plasma applications; Plasma density; Plasma materials processing; Pulse generation; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Pulsed Power Conference, 1997. Digest of Technical Papers. 1997 11th IEEE International
Conference_Location
Baltimore, MA, USA
Print_ISBN
0-7803-4213-5
Type
conf
DOI
10.1109/PPC.1997.674534
Filename
674534
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