Title :
Commentary: Carbon-based Electrical Interconnect and Thermal Interface Materials
Author_Institution :
Center for Nanostruct., Santa Clara Univ., Santa Clara, CA
Abstract :
Summary form only given: As integrated circuit (IC) technology continues the trend towards sub-50 nanometer feature sizes, it is imperative to retain performance of back-end features such as on-chip interconnects while gaining the cost benefit of scaling. Some major barriers to achieving continuous downward scaling include high resistance and questionable reliability of nanoscale copper lines, and power dissipation in densely packed integrated circuits. This work presents fundamental electrical and thermal characterization of carbon nanofibers (CNF) as a possible solution for next-generation back-end integrated circuit processing. Results of temperature-dependent electrical resistance measurements for CNF arrays demonstrate distinct metallic behavior of these novel nanoscale devices. The current capacity of CNF interconnect test structures is examined and the results are compared with an electrothermal transport model. The use of CNF/copper composite material as a thermal interface for IC packaging is explored and fundamental thermal resistance measurement results show promise of such a composite material for thermal management applications.
Keywords :
carbon fibres; composite material interfaces; integrated circuit interconnections; integrated circuit packaging; nanoelectronics; nanostructured materials; thermal management (packaging); CNF; IC interconnects; IC packaging; back-end features; back-end integrated circuit processing; carbon nanofibers; integrated circuit technology; nanometer feature size; nanoscale copper lines; power dissipation; thermal interface materials; thermal management; thermal resistance measurement; Composite materials; Copper; Electric resistance; Electrical resistance measurement; Integrated circuit interconnections; Integrated circuit technology; Nanocomposites; Organic materials; Thermal management; Thermal resistance;
Conference_Titel :
Microelectronics and Electron Devices, 2008. WMED 2008. IEEE Workshop on
Conference_Location :
Boise, ID
Print_ISBN :
978-1-4244-2343-9
DOI :
10.1109/WMED.2008.4510651