• DocumentCode
    3358916
  • Title

    Non-destructive IC defect localization using optical beam-based imaging

  • Author

    Cole, Edward I., Jr.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM
  • fYear
    2008
  • fDate
    21-24 Sept. 2008
  • Firstpage
    53
  • Lastpage
    56
  • Abstract
    Optical beam failure analysis methods provide unique capabilities to identify and localize defect types that would be difficult or impossible by other methods. by understanding the physics of signal generation, the user gains the insight necessary to optimize technique performance.
  • Keywords
    failure analysis; integrated circuit testing; nondestructive testing; failure analysis; nondestructive IC defect localization; optical beam-based imaging; signal generation; Conductors; Optical beams; Optical imaging; Photoconductivity; Photonic integrated circuits; Physics; Power demand; Signal generators; Thermoelectricity; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Custom Integrated Circuits Conference, 2008. CICC 2008. IEEE
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4244-2018-6
  • Electronic_ISBN
    978-1-4244-2019-3
  • Type

    conf

  • DOI
    10.1109/CICC.2008.4672018
  • Filename
    4672018