Title :
Non-destructive IC defect localization using optical beam-based imaging
Author :
Cole, Edward I., Jr.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM
Abstract :
Optical beam failure analysis methods provide unique capabilities to identify and localize defect types that would be difficult or impossible by other methods. by understanding the physics of signal generation, the user gains the insight necessary to optimize technique performance.
Keywords :
failure analysis; integrated circuit testing; nondestructive testing; failure analysis; nondestructive IC defect localization; optical beam-based imaging; signal generation; Conductors; Optical beams; Optical imaging; Photoconductivity; Photonic integrated circuits; Physics; Power demand; Signal generators; Thermoelectricity; Voltage;
Conference_Titel :
Custom Integrated Circuits Conference, 2008. CICC 2008. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-2018-6
Electronic_ISBN :
978-1-4244-2019-3
DOI :
10.1109/CICC.2008.4672018
