DocumentCode
3358916
Title
Non-destructive IC defect localization using optical beam-based imaging
Author
Cole, Edward I., Jr.
Author_Institution
Sandia Nat. Labs., Albuquerque, NM
fYear
2008
fDate
21-24 Sept. 2008
Firstpage
53
Lastpage
56
Abstract
Optical beam failure analysis methods provide unique capabilities to identify and localize defect types that would be difficult or impossible by other methods. by understanding the physics of signal generation, the user gains the insight necessary to optimize technique performance.
Keywords
failure analysis; integrated circuit testing; nondestructive testing; failure analysis; nondestructive IC defect localization; optical beam-based imaging; signal generation; Conductors; Optical beams; Optical imaging; Photoconductivity; Photonic integrated circuits; Physics; Power demand; Signal generators; Thermoelectricity; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Custom Integrated Circuits Conference, 2008. CICC 2008. IEEE
Conference_Location
San Jose, CA
Print_ISBN
978-1-4244-2018-6
Electronic_ISBN
978-1-4244-2019-3
Type
conf
DOI
10.1109/CICC.2008.4672018
Filename
4672018
Link To Document