DocumentCode
3360288
Title
Characterization and design for variability and reliability
Author
Nowka, Kevin ; Nassif, Sani ; Agarwal, Kanak
Author_Institution
IBM Austin Res. Lab., Austin, TX
fYear
2008
fDate
21-24 Sept. 2008
Firstpage
341
Lastpage
346
Abstract
Device variability due to sub-wavelength lithography, layout complexity, and random effects is impacting manufacturable design. Defects, aging, and noise must also be accounted for in design and manufacturing. Characterization structures to quantify these effects, measured behaviors, the resulting models, and design and tools mitigation actions are presented in this paper.
Keywords
design for manufacture; integrated circuit design; integrated circuit layout; integrated circuit reliability; lithography; IC industry; device variability; layout complexity; manufacturable design; reliability; subwavelength lithography; Aging; Lithography; Manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Custom Integrated Circuits Conference, 2008. CICC 2008. IEEE
Conference_Location
San Jose, CA
Print_ISBN
978-1-4244-2018-6
Electronic_ISBN
978-1-4244-2019-3
Type
conf
DOI
10.1109/CICC.2008.4672092
Filename
4672092
Link To Document