Title :
Session 15 - IC Technology - more Moore and more than Moore
Author :
Loke, Alvin ; Lai, Jordan
Author_Institution :
Advanced Micro Devices, USA
Abstract :
This session of exclusively invited papers covers a selection of key developments extending CMOS scaling as well as several non-CMOS technologies with pervasive applications. Included are an overview of lithography options beyond 45nm, high-K/metal-gate technology, high-speed BiCMOS, and opportunities orthogonal to conventional scaling.
Conference_Titel :
Custom Integrated Circuits Conference, 2008. CICC 2008. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-2018-6
DOI :
10.1109/CICC.2008.4672099
