Title :
Wideband mmWave CML static divider in 65nm SOI CMOS technology
Author :
Kim, Daeik D. ; Cho, Choongyeun ; Jonghae Kim ; Plouchart, Jean-Olivier
Author_Institution :
Semicond. R & D Center, IBM, Hopewell Junction, NY
Abstract :
A wideband millimeter-wave (mmWave) CML static divider fabricated in 65 nm SOI CMOS technology is presented. The mmWave system realization trend and engagement in sub-100 nm CMOS technologies are summarized. CML static dividerpsilas circuit analysis, sensitivity curve, and simulations are explored. The input-locking hysteresis and divider DC bias tuning are employed to extend the divider operation range. The divider performance measurements are presented with hysteresis-assisted gain and figure-of-merits. A scalable statistical estimation is proposed, and it is validated with a full 300 mm wafer measurements. The divider exhibits wideband mmWave performance to overcome the process variability in sub-100 nm CMOS processes.
Keywords :
CMOS integrated circuits; circuit tuning; millimetre wave circuits; sensitivity analysis; silicon-on-insulator; statistical analysis; SOI CMOS technology; circuit analysis; divider DC bias tuning; input-locking hysteresis; sensitivity curve; size 65 nm; statistical estimation; wafer measurements; wideband CML static divider; wideband millimeter-wave CML static divider fabrication; Analytical models; CMOS technology; Circuit analysis; Circuit optimization; Circuit simulation; Hysteresis; Measurement; Millimeter wave circuits; Millimeter wave technology; Wideband;
Conference_Titel :
Custom Integrated Circuits Conference, 2008. CICC 2008. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-2018-6
Electronic_ISBN :
978-1-4244-2019-3
DOI :
10.1109/CICC.2008.4672164