DocumentCode
3362246
Title
Static power optimization of a Full-Adder under Front-End of Line systematic variations
Author
Aghababa, Hossein ; Afzali-Kusha, Ali ; Forouzandeh, Behjat
Author_Institution
Sch. of Electr. & Comput. Eng., Univ. of Tehran, Tehran, Iran
fYear
2009
fDate
15-17 Nov. 2009
Firstpage
1
Lastpage
6
Abstract
Process variation as a major concern in the current and future generations of CMOS circuits manufacturing has imposed a great deal of effort in design process. Basically, process variations are generally divided in two main categories: random variations and systematic variations. Therefore, physical designers of integrated circuits (ICs) have to take into account the effects of random and systematic process variations in the design process. As the critical dimension (CD) of transistors scale down, the effects of Front-End of Line (FEOL) systematic variations have been proved to be a great contributor of performance variability of ICs. Because of Across Chip Line-Width (ACLV) variation during lithography process, the channel length of transistor is subject to remarkable variations. As a result, the performance of IC becomes highly sensitive to these variations. In this paper we propose a leakage-aware optimization methodology which improves the performance of circuit in terms of standby static power and power delay product (PDP). We apply this methodology on a conventional ripple-carry full-adder as a basic block in VLSI circuits and systems for verification purposes. Besides, this method effectively improves the static power yield by almost 14% in average.
Keywords
CMOS integrated circuits; VLSI; integrated circuit design; leakage currents; logic devices; CMOS circuits; VLSI; critical dimension; full-adder; integrated circuit design; leakage-aware optimization; power delay product; power optimization; process variation; static power; CMOS technology; Circuits; Computer aided manufacturing; Constraint optimization; Lithography; Manufacturing processes; Optimization methods; Power dissipation; Process design; Timing; CMOS integrated circuits; leakage reduction; leakage-aware optimization; systematic variations;
fLanguage
English
Publisher
ieee
Conference_Titel
Design and Test Workshop (IDT), 2009 4th International
Conference_Location
Riyadh
Print_ISBN
978-1-4244-5748-9
Type
conf
DOI
10.1109/IDT.2009.5404117
Filename
5404117
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