DocumentCode
3362302
Title
Diverse nanotextured surface fabricated by directional photofluidization lithography and their application for wettability control
Author
Kang, Hong Suk ; Lee, Seungwoo ; Lee, Jihye ; Sung-Wook Kang ; Lee, Sol-Ah ; Park, Jung-Ki
Author_Institution
Graduate School of EEWS, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Korea
fYear
2011
fDate
18-21 Oct. 2011
Firstpage
518
Lastpage
519
Abstract
Nanotextured surface have attracted a great interest due to its application to a promising tool for advanced photonics and interface sciences. Although many impressive results to fabricate such nanotextured surface have been achieved over the last decade, all established methods are still restricted by a number of factors such as limited control of structural features, inherently induced-structural defects, complicated process, and technical barriers caused by mechanical contact. Herein, to overcome those limitations, we suggest a facile and scalable fabrication of nanotextured surface reliefs with precisely controlled structural feature by using directional photofluidization lithography (DPL). In particular, we show that the structural features of nanotextured surface including shapes and modulation heights could be deterministically tunable by adjusting the polarization and irradiation time of interference pattern when irradiated on the pristine azopolymer´s line arrays. Moreover, we address a long-lasting question, what is the origin of surface relief gratings (SRGs) formation onto azopolymer film in terms of polymeric bulk photo-flows, directional photofluidization, by a direct visualization of polymeric flow according to the light polarization. Finally, in a practical application of the obtained nanotextured surface, we demonstrate their wetting properties depending on the modulating heights.
Keywords
Fabrication; Gratings; Interference; Nanoscale devices; Surface morphology; Surface texture; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology Materials and Devices Conference (NMDC), 2011 IEEE
Conference_Location
Jeju
Print_ISBN
978-1-4577-2139-7
Type
conf
DOI
10.1109/NMDC.2011.6155282
Filename
6155282
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