• DocumentCode
    3363892
  • Title

    Observation of polarization reversal processes in Pb(Zr,Ti)O3 thin films using atomic force microscopy

  • Author

    Fujisawa, H. ; Matsumoto, Y. ; Shimizu, M. ; Niu, H.

  • Author_Institution
    Dept. of Electron., Himeji Inst. of Technol., Hyogo, Japan
  • Volume
    2
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    619
  • Abstract
    The piezoresponse-imaging technique using atomic force microscopy (AFM) provides a substantial understanding of the polarization reversal process of ferroelectric thin films at the nanoscale level. In this study, in order to investigate the polarization reversal process and its dynamics in Pb(Zr,Ti)O3 (PZT) thin films, we examined the dependence of the switched area on the width of the switching pulse. The area of the switched domain increased from 2 × 10-3 to 3 × 10-1 μm2 as the pulse width increased from 500 ns to 100 ms. The switched area rapidly increased in the initial polarization process as the applied pulse width increased. However, the switched area stopped expanding at the grain boundaries and domain growth over grain boundaries was not observed
  • Keywords
    atomic force microscopy; dielectric polarisation; electric domain walls; ferroelectric switching; ferroelectric thin films; grain boundaries; lead compounds; 500 ns to 100 ms; AFM; D-E hysteresis loop; PZT; PZT thin film capacitors; PZT thin films; Pb(Zr,Ti)O3 thin films; PbZrO3TiO3; atomic force microscopy; domain wall sideward motions; ferroelectric thin films; grain boundaries; initial polarization process; nanoscale level; piezoresponse-imaging technique; polarization reversal process; switched domain area; switching pulse width; Atomic force microscopy; Electron microscopy; Ferroelectric materials; Grain boundaries; Microwave integrated circuits; Polarization; Pulse measurements; Space vector pulse width modulation; Transistors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
  • Conference_Location
    Honolulu, HI
  • ISSN
    1099-4734
  • Print_ISBN
    0-7803-5940-2
  • Type

    conf

  • DOI
    10.1109/ISAF.2000.942397
  • Filename
    942397