DocumentCode :
336496
Title :
Area-efficient area pad design for high pin-count chips
Author :
Luh, Louis ; Chroma, J. ; Draper, Jeffrey
Author_Institution :
Univ. of Southern California, Los Angeles, CA, USA
fYear :
1999
fDate :
4-6 Mar 1999
Firstpage :
78
Lastpage :
81
Abstract :
This paper presents an area pad layout method to efficiently reduce the space required for interconnection pads and pad drivers. Unlike peripheral pads, area pads use only the top metal layer and therefore allow active circuitry to be laid out underneath. With identical functional elements grouped together, a group of pad drivers share the same well and can be placed tightly together. The use of silicided diffusion reduces the well contact to diffusion contact spacing requirement. By taking advantage of this spacing requirement and using serpentine gate layout, a driver´s size can be effectively reduced without reducing the driving capacity. An embedded multicomputer router interface chip has been implemented using these techniques and has achieved 554 pads in a 9 mm×6 mm chip with a 0.8 μm single-poly 3-metal N-well CMOS process
Keywords :
CMOS integrated circuits; VLSI; integrated circuit layout; 0.8 micron; area pad design; area pad layout method; area-efficient pad design; diffusion contact spacing requirement; driver size reduction; embedded multicomputer router interface chip; high pin-count chips; interconnection pads; pad drivers; serpentine gate layout; silicided diffusion; single-poly 3-metal N-well CMOS process; top metal layer; well contact; Atherosclerosis; Bonding; CMOS process; Driver circuits; Electrostatic discharge; Integrated circuit interconnections; MOSFETs; Rails; Routing; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI, 1999. Proceedings. Ninth Great Lakes Symposium on
Conference_Location :
Ypsilanti, MI
ISSN :
1066-1395
Print_ISBN :
0-7695-0104-4
Type :
conf
DOI :
10.1109/GLSV.1999.757381
Filename :
757381
Link To Document :
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