Title :
Residual stresses in the electrode of Pt/Ti for the thermal detector with thin-film structure
Author :
Kim, Kibeom ; Yoo, Mina ; Lee, Sangil ; Kim, Dohoon ; Bae, Seongho ; Lee, Moonho
Author_Institution :
Dept. of Appl. Electron., Yeungnam Univ., Kyungsan, South Korea
Abstract :
Residual stress of Pt/Ti thin film electrode was investigated as a function of substrate temperature by using of XRD and SEM. In order to develop the residual stress, stress sensitive structures of Pt/Ti thin film on SiO2/Si(substrate) were fabricated. Thermally induced residual stress, which was originated in the different thermal expansion coefficients between film and substrate, was led to the dimensional change of overall structure. XRD results confirmed the existence of internal stresses on Pt/Ti thin film
Keywords :
X-ray diffraction; internal stresses; metallic thin films; platinum; scanning electron microscopy; thermal expansion; titanium; Pt-Ti; Pt/Ti; SEM; SiO2-Si; XRD; residual stresses; stress sensitive structures; thermal detector; thermal expansion coefficients; thin-film structure; Annealing; Detectors; Electrodes; Grain size; Residual stresses; Substrates; Temperature; Thermal stresses; Transistors; X-ray scattering;
Conference_Titel :
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5940-2
DOI :
10.1109/ISAF.2000.942470
