Title :
A theory for the image production mechanism of scanning nonlinear dielectric microscopy and its application to the quantitative evaluation of linear and nonlinear dielectric properties of ferroelectric and piezoelectric materials
Author :
Cho, Yasuo ; Ohara, Koya ; Kazuta, Satoshi ; Odagawa, Hiroyuki
Author_Institution :
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan
Abstract :
A theory for scanning nonlinear dielectric microscopy (SNDM) and its application to the quantitative evaluation of the linear and nonlinear dielectric constants of dielectric materials are described. First, a general theorem for the capacitance variation under an applied electric field is derived and a capacitance variation susceptibility S nl, which is a very useful parameter for the quantitative measurement of nonlinear dielectric constants, is defined. This Snl is independent of the tip radius, and therefore the sensitivity of the SNDM probe does not change, even if a tip with a smaller radius is selected to obtain a finer resolution. Using the theoretical results and the data taken by SNDM, the quantitative linear and nonlinear dielectric properties of several dielectric materials were successfully determined. From the calculation of a one-dimensional image of a 180° c-c domain boundary, it is demonstrated that the SNDM has an atomic scale resolution
Keywords :
capacitance; electric domain walls; ferroelectric materials; permittivity; piezoelectric materials; scanning probe microscopy; 180° c-c domain boundary; 1D image; applied electric field; atomic scale resolution; capacitance variation susceptibility; dielectric constants; dielectric materials; ferroelectric materials; image production mechanism; linear dielectric properties; nonlinear dielectric properties; piezoelectric materials; scanning nonlinear dielectric microscopy; Capacitance; Dielectric constant; Dielectric materials; Dielectric measurements; Electric variables measurement; Ferroelectric materials; Frequency; Microscopy; Probes; Production;
Conference_Titel :
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5940-2
DOI :
10.1109/ISAF.2000.942499