Title :
Function-based cost modeling for wafer manufacturing and its application to strategic management
Author :
Guo, Ruey-Shan ; Chen, Argon ; Lin, Pei-Lan ; Shih, Yih-Cheng
Author_Institution :
Dept. of Ind. Manage., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
In this paper a function-based cost modeling methodology is proposed, which consists of three major steps: function analysis, cost modeling and strategic management. A system analysis technique IDEFO is used as the basis of function analysis. Function-based cost models are then constructed, and with which pie-chart analysis and sensitivity analysis provide managers important information for critical decision-making. A generic photolithography process is used as a test bed. Results show that IDEFO is an effective tool for modeling IC manufacturing processes and the manufacturing cost based on the proposed methodology is more easily and accurately calculated than the current practices
Keywords :
costing; integrated circuit economics; photolithography; semiconductor process modelling; sensitivity analysis; strategic planning; IC manufacturing; IDEFO; cost modeling; decision making; function analysis; photolithography; pie chart; semiconductor wafer manufacturing; sensitivity analysis; strategic management; system analysis; Cost function; Decision making; Information analysis; Information management; Integrated circuit modeling; Lithography; Manufacturing processes; Semiconductor device modeling; Sensitivity analysis; Virtual manufacturing;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-5403-6
DOI :
10.1109/ISSM.1999.808731