Particle characteristics of 300-mm minienvironment (FOUP and LPU)

Author

Kobayashi, S. ; Tokunaga, Kenji ; Kobayashi, Yoshiyuki ; Kato, Koji ; Minami, Teruo

Author_Institution

Hitachi Ltd., Ibaraki, Japan

fYear

1999

fDate

1999

Firstpage

39

Lastpage

42

Abstract

We have clarified the particle characteristics of a front opening unified pod (FOUP) and a load port unit (LPU) experimentally. The FOUP and LPU are fundamental components in 300-mm minienvironment systems. Our experiments showed that; (1) The particles per wafer pass (PWP) increases with the number of airborne particles outside the enclosure. (2) The particle characteristics of FOUP and LPU can be improved by reducing the FOUP door opening speed. (3) The PWP of the wafer in the top slot is remarkably high. By optimizing the FOUP door-opening speed, we can achieve FOUP and LPU particle characteristics similar to those of a standard mechanical interface (SMIF) system

Keywords

clean rooms; surface contamination; 300 mm; FOUP; LPU; cleanliness; door opening speed; front opening unified pod; load port unit; minienvironment; particles per wafer pass; particulate contamination; semiconductor wafer fabrication; standard mechanical interface; Computational fluid dynamics; Contamination; Costs; Fabrication; Filters; Isolation technology; Manufacturing; Tires; Wiring;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on

Conference_Location

Santa Clara, CA

ISSN

1523-553X

Print_ISBN

0-7803-5403-6

Type

conf

DOI

10.1109/ISSM.1999.808733

Filename

808733