Title :
Ultraviolet step-index silica single mode fiber as a spatial filter for interference lithography
Author :
Mikolas, David ; En-Chiang Chang ; Pao-Te Lin ; Yi-Lin Sun ; Chien-Chung Fu
Author_Institution :
Inst. of NEMS, Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
We present the use of single mode optical fiber (SMF) as an effective and superior spatial filter as a source for an expanded ultraviolet beam used in interference lithography (IL). IL is used to produce nanopatterned structures with a period of 220nm in photoresist on samples over areas of many square centimeters. The SMF further acts as a flexible laser beam transport system replacing relay mirrors. Finally we demonstrate that with normal SMF (not polarization maintaining) it is still possible to preserve linear polarization over 60cm length of fiber with a purity of 100:1. The output UV beam is shown to fit the far-field intensity pattern of a single LP01 with a numerical aperture of 0.09.
Keywords :
laser beams; laser mirrors; nanolithography; nanopatterning; photoresists; silicon compounds; spatial filters; SMF; SiO2; far-field intensity pattern; interference lithography; laser beam transport system; nanopatterned structures; numerical aperture; photoresist; relay mirrors; single mode optical fiber; spatial filter; ultraviolet beam; ultraviolet step-index silica; Laser beams; IL; SMF; UV; Ultraviolet; interference lithography; nanopattern; single mode fiber;
Conference_Titel :
Advanced Infocomm Technology (ICAIT), 2013 6th International Conference on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4799-0464-8
DOI :
10.1109/ICAIT.2013.6621571
