Nanomagnetomechanical resonators

Author

Freeman, Mark R. ; Davis, John P. ; Liu, Ning ; Losby, Joseph ; Fraser, Alastair ; Burgess, Jacob A J ; Compton, Shawn ; Fortin, David C. ; Vick, Doug ; Hiebert, Wayne K.

Author_Institution

Dept. of Phys., Univ. of Alberta, Edmonton, AB, Canada

fYear

2010

fDate

20-24 Sept. 2010

Firstpage

291

Lastpage

293

Abstract

Motivated by functions that could be enabled with combined nanomechanical and nanomagnetic structures, we have embarked on a program of fabrication and characterization of nanomagnetomechanical systems. Fabrication strategies include conventional electron beam lithography with release from a sacrificial layer, and focused ion beam nanomachining of “2D” and “3D” precursor materials. Characterization approaches incorporate frequency-domain and time-domain techniques, with the latter extending out to GHz scales. Fundamentally and for applications, the dynamics of nanomagnetomechanical systems must be understood from a time domain perspective, requiring expansion of the range of studies and applications of nanomechanical systems beyond those emphasizing frequency domain operation.

Keywords

electron beam lithography; focused ion beam technology; machining; micromechanical resonators; nanomagnetics; nanomechanics; electron beam lithography; fabrication strategies; focused ion beam nanomachining; frequency domain operation; frequency-domain techniques; nanomagnetic structures; nanomagnetomechanical resonators; nanomechanical structures; precursor materials; sacrificial layer; time domain perspective; time-domain techniques; Garnets; Magnetic domains; Magnetic resonance; Magnetomechanical effects; Magnetometers; Optical resonators;

fLanguage

English

Publisher

ieee

Conference_Titel

Electromagnetics in Advanced Applications (ICEAA), 2010 International Conference on

Conference_Location

Sydney, NSW

Print_ISBN

978-1-4244-7366-3

Type

conf

DOI

10.1109/ICEAA.2010.5653637

Filename

5653637