• DocumentCode
    3368222
  • Title

    High-speed and sensitive multiple-point ammonia gas monitor system

  • Author

    Matsuyoshi, Y. ; Satoh, Yuuichi ; Shinozaki, Tsutomu ; Suzuki, Eiko ; Nagata, Norimasa

  • Author_Institution
    Production Eng. Dev. Lab., NEC Corp., Kanagawa, Japan
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    409
  • Lastpage
    412
  • Abstract
    In order to get a precise pattern control in a chemically amplified photo-resist process, the high performance multi-point ammonia gas monitor was developed. A single point high speed and sensitive ammonia monitor was reported in ISSM´96. This system has expanded its ability by adding 16 measurement ports, 4 diffusion scrubbers, and one analyzer. As a result, it provided the capability of measuring 9 sampling data for each point per day. Its sensitivity is sub μg/m3 which is enough to watch, for example to detect the change of people in a clean-room, and it is able to monitor 40 meters away in radius. This system is already in a field test, and it shows a good performance for daily watch of our new research and development line
  • Keywords
    ammonia; clean rooms; gas sensors; integrated circuit manufacture; photoresists; process monitoring; production testing; NH3; chemically amplified photo-resist process; clean-room; diffusion scrubbers; field test; measurement ports; multiple-point ammonia gas monitor system; precise pattern control; sampling data; Accidents; Cleaning; Conductivity measurement; Monitoring; National electric code; Pollution measurement; Resists; Sampling methods; Velocity measurement; Watches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on
  • Conference_Location
    Santa Clara, CA
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-5403-6
  • Type

    conf

  • DOI
    10.1109/ISSM.1999.808823
  • Filename
    808823