• DocumentCode
    3369415
  • Title

    Characteristics of InxAl1-xAs/InxGa1-xAs (x=50%, 60%) metamorphic HEMTs on GaAs substrates

  • Author

    Lin, Cheng-Kuo ; Wu, Jing-Chang ; Wang, Wen-Kai ; Chan, Yi-Jen

  • Author_Institution
    Dept. of Electr. Eng., Nat. Central Univ., Chung-li, Taiwan
  • fYear
    2004
  • fDate
    31 May-4 June 2004
  • Firstpage
    205
  • Lastpage
    208
  • Abstract
    We have developed the InxAl1-xAs/InxGa1-xAs (x = 50%, 60%) metamorphic HEMTs (m-HEMTs) on GaAs substrates. The current gain cut-off frequency (fT), and the threshold voltage have been investigated versus the gate-length. The improved microwave performance in smaller gate-length devices is mainly associated with the reduction of the electron-transit time. After analyzing the extrinsic total delay time, the effective velocity of electrons can be estimated, and the velocities are 2.3 × 107 and 2.8 × 107 cm/s for the indium composition of 50% and 60% in the InGaAs channel, respectively.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; millimetre wave transistors; GaAs; InxAl1-xAs-InxGa1-xAs; current gain cut-off frequency; electrons velocity; indium composition; metamorphic HEMT; millimeter wave devices; threshold voltage; Delay effects; Delay estimation; Gallium arsenide; Indium; Lithography; Millimeter wave communication; Millimeter wave devices; Millimeter wave technology; Threshold voltage; mHEMTs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-8595-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2004.1442647
  • Filename
    1442647