DocumentCode :
3369415
Title :
Characteristics of InxAl1-xAs/InxGa1-xAs (x=50%, 60%) metamorphic HEMTs on GaAs substrates
Author :
Lin, Cheng-Kuo ; Wu, Jing-Chang ; Wang, Wen-Kai ; Chan, Yi-Jen
Author_Institution :
Dept. of Electr. Eng., Nat. Central Univ., Chung-li, Taiwan
fYear :
2004
fDate :
31 May-4 June 2004
Firstpage :
205
Lastpage :
208
Abstract :
We have developed the InxAl1-xAs/InxGa1-xAs (x = 50%, 60%) metamorphic HEMTs (m-HEMTs) on GaAs substrates. The current gain cut-off frequency (fT), and the threshold voltage have been investigated versus the gate-length. The improved microwave performance in smaller gate-length devices is mainly associated with the reduction of the electron-transit time. After analyzing the extrinsic total delay time, the effective velocity of electrons can be estimated, and the velocities are 2.3 × 107 and 2.8 × 107 cm/s for the indium composition of 50% and 60% in the InGaAs channel, respectively.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; millimetre wave transistors; GaAs; InxAl1-xAs-InxGa1-xAs; current gain cut-off frequency; electrons velocity; indium composition; metamorphic HEMT; millimeter wave devices; threshold voltage; Delay effects; Delay estimation; Gallium arsenide; Indium; Lithography; Millimeter wave communication; Millimeter wave devices; Millimeter wave technology; Threshold voltage; mHEMTs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
ISSN :
1092-8669
Print_ISBN :
0-7803-8595-0
Type :
conf
DOI :
10.1109/ICIPRM.2004.1442647
Filename :
1442647
Link To Document :
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