DocumentCode :
3369418
Title :
3D integrable nanowire FET sensor with intrinsic sensitivity boost
Author :
Chui, Chi On ; Kina, Jorge ; Shin, Kyeong-Sik
Author_Institution :
Dept. of Electr. Eng., Univ. of California, Los Angeles, CA, USA
fYear :
2011
fDate :
2-4 May 2011
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, we review a recently developed transformative nanowire FET sensor concept and 3D-compatible fabrication technology. Compared to the generic nanowire FET sensors, an intrinsic boost in detection sensitivity is accomplished through the seamless integration of a sensing nanowire with an amplifying nanowire FET. Exclusively enabled by top-down nanofabrication technology, the back-end-of-line compatible sub-450 °C manufacturing processes have been developed. Sensing experimental data have also revealed around 1 order of magnitude sensitivity improvement in solution pH detection. Finally, an ultra-low thermal budget nanowire formation technology has been preliminarily developed for future 3D integration with CMOS.
Keywords :
electric sensing devices; field effect transistors; nanoelectronics; nanowires; three-dimensional integrated circuits; 3D integrable nanowire FET sensor; 3D-compatible fabrication technology; intrinsic sensitivity boost; top-down nanofabrication; ultralow thermal budget nanowire formation technology; FETs; Fabrication; Nanobioscience; Sensitivity; Sensors; Silicon; Substrates; 3D integration; biosensor; field-effect device; nanowire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
IC Design & Technology (ICICDT), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
ISSN :
Pending
Print_ISBN :
978-1-4244-9019-6
Type :
conf
DOI :
10.1109/ICICDT.2011.5783190
Filename :
5783190
Link To Document :
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