• DocumentCode
    3369468
  • Title

    Variation tolerant sensing scheme of Spin-Transfer Torque Memory for yield improvement

  • Author

    Sun, Zhenyu ; Li, Hai ; Chen, Yiran ; Wang, Xiaobin

  • Author_Institution
    6 MetroTech Center, Polytech. Inst. of New York Univ., Brooklyn, OH, USA
  • fYear
    2010
  • fDate
    7-11 Nov. 2010
  • Firstpage
    432
  • Lastpage
    437
  • Abstract
    Spin-Transfer Torque Random Access Memory (STT-RAM) demonstrated great potentials as an universal memory for its fast access speed, zero standby power, excellent scalability and simplicity of cell structure. However, large process variations of both magnetic tunneling junction and CMOS process severely limit the yield of STT-RAM chips and prevent the massive production from happening. In this paper, we analyze the impacts of process variations on various sensing schemes of STT-RAM. Based on our analysis, we propose a novel voltage-driven non-destructive self-reference sensing scheme (VDRS) to enhance the STT-RAM chip yield by significantly improving sense margin. Monte-Carlo simulations of a 16Kb STT-RAM array shows that VDRS can achieve the same yield as the previous non-destructive self-reference sensing scheme while improving the sense margin by 5.16 times with the similar access performance and power.
  • Keywords
    Monte Carlo methods; integrated circuit yield; magnetic tunnelling; random-access storage; CMOS process; Monte-Carlo simulation; STT-RAM chip; access speed; cell structure; magnetic tunneling junction; process variation; sense margin; spin-transfer torque random access memory; universal memory; variation tolerant sensing scheme; voltage-driven nondestructive self-reference sensing scheme; yield improvement; zero standby power; Magnetic tunneling; Mirrors; Monte Carlo methods; Random access memory; Resistance; Sensors; Transistors; STT-RAM; process variations; yield;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computer-Aided Design (ICCAD), 2010 IEEE/ACM International Conference on
  • Conference_Location
    San Jose, CA
  • ISSN
    1092-3152
  • Print_ISBN
    978-1-4244-8193-4
  • Type

    conf

  • DOI
    10.1109/ICCAD.2010.5653720
  • Filename
    5653720