Fabrication of ultra-thin InP membranes and their application for high reflective mirrors in tunable vertical-cavity devices

Author

Strassner, M. ; Leclercq, J.L. ; Sagnes, I.

Author_Institution

Laboratoire de Photonique et de Nanostructure, CNRS, Marcoussis, France

fYear

2004

fDate

31 May-4 June 2004

Firstpage

221

Lastpage

223

Abstract

In this paper, InP membranes featuring a thickness of only 123 nm are presented for the first time. The chosen thickness of the air-gap and the InP membrane equal the optical thickness of λ/4 layers at 1.55 μm. Tunable micro-cavities have been fabricated to evaluate their tunability in dependence on the membrane thickness. Furthermore, a high reflective mirror (R>99.8%) with a stop-band of more than 800 nm has been manufactured.

Keywords

III-V semiconductors; chemical vapour deposition; distributed Bragg reflectors; indium compounds; membranes; micro-optics; microcavities; optical fabrication; optical films; optical tuning; reflectivity; semiconductor thin films; 1.55 mum; 123 nm; InP; optical thickness; reflective mirrors; tunable microcavities; tunable vertical-cavity devices; ultrathin InP membranes; Air gaps; Biomembranes; Indium phosphide; Mirrors; Optical device fabrication; Optical materials; Optical refraction; Optical variables control; Tunable circuits and devices; Wavelength division multiplexing;

fLanguage

English

Publisher

ieee

Conference_Titel

Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on

ISSN

1092-8669

Print_ISBN

0-7803-8595-0

Type

conf

DOI

10.1109/ICIPRM.2004.1442652

Filename

1442652