DocumentCode :
3369790
Title :
Impacts of intrinsic device variations on the stability of FinFET subthreshold SRAMs
Author :
Chen, Yin-Nien ; Hsieh, Chien-Yu ; Fan, Ming-Long ; Hu, Vita Pi-Ho ; Su, Pin ; Chuang, Ching-Te
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
fYear :
2011
fDate :
2-4 May 2011
Firstpage :
1
Lastpage :
4
Abstract :
In this work, we investigate the impacts of intrinsic device variations on FinFET subthreshold SRAMs, including the conventional tied-gate 6T SRAM, tied-gate 10T Schmitt Trigger based SRAMs, and recently proposed independent-gate controlled 8T Schmitt Trigger based SRAMs. The impacts of intrinsic random device variations, including Fin Line-Edge Roughness (LER) and Work Function Variation (WFV), on the device threshold voltage Vth, Subthreshold Swing (S.S.) and stability of FinFET SRAMs operating in subthreshold region are assessed using 3D atomistic mixed-mode Monte-Carlo simulations. The results indicate that Fin LER is the dominant factor limiting the stability of FinFET subthreshold SRAMs, since Fin LER degrades both Vth fluctuation and S.S., while WFV mainly affects only Vth fluctuation. The independent-gate controlled Schmitt Trigger SRAMs are shown to offer adequate stability for the intended subthreshold applications even considering intrinsic device variations.
Keywords :
MOSFET; Monte Carlo methods; SRAM chips; work function; 3D atomistic mixed-mode Monte-Carlo simulations; Fin LER; FinFET subthreshold SRAM; conventional tied-gate 6T SRAM; device threshold voltage; fin line-edge roughness; independent-gate controlled 8T Schmitt Trigger based SRAM; intrinsic device variations; intrinsic random device variations; subthreshold swing; tied-gate 10T Schmitt Trigger based SRAM; work function variation; FinFETs; Logic gates; Monte Carlo methods; Random access memory; Stability analysis; Three dimensional displays; Wireless sensor networks; Line-Edge Roughness (LER); Schmitt Trigger; Subthreshold SRAM; Work Function Variation (WFV);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
IC Design & Technology (ICICDT), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
ISSN :
Pending
Print_ISBN :
978-1-4244-9019-6
Type :
conf
DOI :
10.1109/ICICDT.2011.5783210
Filename :
5783210
Link To Document :
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