DocumentCode
3370290
Title
Evaluation of using inductive/capacitive-coupling vertical interconnects in 3D network-on-chip
Author
Ouyang, Jin ; Xie, Jing ; Poremba, Matthew ; Xie, Yuan
fYear
2010
fDate
7-11 Nov. 2010
Firstpage
477
Lastpage
482
Abstract
In recent 3DIC studies, through silicon vias (TSV) are usually employed as the vertical interconnects in the 3D stack. Despite its benefit of short latency and low power, forming TSVs adds additional complexities to the fabrication process. Recently, inductive/capactive-coupling links are proposed to replace TSVs in 3D stacking because the fabrication complexities of them are lower. Although state-of-the-art inductive/capacitive-coupling links show comparable bandwidth and power as TSV, the relatively large footprints of those links compromise their area efficiencies. In this work, we study the design of 3D network-on-chip (NoC) using inductive/capacitive-coupling links. We propose three techniques to mitigate the area overhead introduced by using these links: (a) serialization, (b) in-transceiver data compression, and (c) high-speed asynchronous transmission. With the combination of these three techniques, evaluation results show that the overheads of all aspects caused by using inductive/capacitive-coupling vertical links can be bounded under 10%.
Keywords
coupled circuits; integrated circuit interconnections; network-on-chip; three-dimensional integrated circuits; 3D network-on-chip; TSV; high-speed asynchronous transmission; in-transceiver data compression; inductive/capacitive-coupling links; inductive/capacitive-coupling vertical interconnects; serialization; through silicon vias; Couplings; Data compression; Registers; Three dimensional displays; Through-silicon vias; Transceivers; Transmitters;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer-Aided Design (ICCAD), 2010 IEEE/ACM International Conference on
Conference_Location
San Jose, CA
ISSN
1092-3152
Print_ISBN
978-1-4244-8193-4
Type
conf
DOI
10.1109/ICCAD.2010.5653769
Filename
5653769
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