Title :
Energy Diagnostics of Pulsed Powerful Hard X-Ray Sources Based on Plasma Focus Discharges
Author :
Zambra, M. ; Silva, P. ; Soto, L. ; Raspa, V. ; Sigaut, L. ; Vieytes, R. ; Clausse, A. ; Moreno, C. ; Pavez, C.
Author_Institution :
Comision Chilena de Energia Nucl., Santiago
Abstract :
Two plasma focus devices were studied as pulsed sources of high-energy X-ray radiation. High-sensitivity, fast-response commercial radiographic film was used as X-ray detector. The relevant characteristics of the pulsed polyenergetic radiation are discussed in terms of its effective mean attenuation with the penetration distance on different metallic samples. The effective characteristic thickness for each metal was obtained. These results were then used to assess the spectral properties of the radiation pulses for each device as function of charging pressure and voltage. From them, effective energies of the X-rays belonging to the 80 - 110 keV ranges were obtained.
Keywords :
discharges (electric); plasma X-ray sources; plasma diagnostics; plasma focus; pulsed power technology; charging pressure function; charging voltage function; electron volt energy 80 keV to 110 keV; energy diagnostics; fast-response commercial radiographic film; mean attenuation; plasma focus discharges; pulsed polyenergetic radiation; pulsed powerful hard X-ray sources; spectral properties; Attenuation; Diagnostic radiography; Fault location; Plasma applications; Plasma devices; Plasma diagnostics; Plasma properties; Plasma sources; Plasma x-ray sources; X-ray detectors;
Conference_Titel :
Pulsed Power Conference, 2005 IEEE
Conference_Location :
Monterey, CA
Print_ISBN :
0-7803-9189-6
Electronic_ISBN :
0-7803-9190-x
DOI :
10.1109/PPC.2005.300726