• DocumentCode
    3371199
  • Title

    Polarisation insensitive electroabsorption modulator with record power saturation using strained InGaAsP/InGaAsP/InAsP MQW structure

  • Author

    Ougazzaden, A. ; Devaux, F.

  • Author_Institution
    France Telcom, CNET, Bagneux, France
  • fYear
    1996
  • fDate
    21-25 Apr 1996
  • Firstpage
    238
  • Lastpage
    239
  • Abstract
    Polarisation insensitive multi-quantum wells electroabsorption modulators becomes very attractive for optical communications, in particular for in line applications where the incident light polarisation is random. One key issue of the modulators remains their power saturation. The phenomenon cited as limiting power saturation is the accumulation of holes, in the quantum wells, which creates screening of applied field. To overcome this problem a low height barrier for holes is necessary to decrease the escape time of holes. In the InGaAsP system the relatively large valance band offset prevents a fast holes evacuation. Consequently the quaternary compositions range for wells and barriers which satisfied the two requirements, high power saturation and polarisation insensitivity, is very narrow. In this study we report a innovative design with strain multiquantum well structure InGaAsP/InGaAsP/InAsP giving high power saturation together with polarisation insensitivity. A careful analysis of the structure in terms of band gap engineering has been performed to fulfil the requirements. The growth has been performed by MOCVD at atmospheric pressure. The quality material assessed by photocurrent, DDX, TEM and photoluminescence measurements are presented
  • Keywords
    III-V semiconductors; electro-optical modulation; electroabsorption; gallium arsenide; gallium compounds; indium compounds; optical communication equipment; optical fabrication; optical saturation; photoemission; photoluminescence; semiconductor heterojunctions; semiconductor quantum wells; transmission electron microscopy; vapour phase epitaxial growth; 1 atm; DDX measurements; InAsP; InGaAsP; InGaAsP-InGaAsP-InAsP; InGaAsP/InGaAsP/InAsP; MOCVD; MQW structure; TEM measurements; atmospheric pressure; band gap engineering; electroabsorption modulator; escape time; in line applications; low height barrier; photocurrent measurements; photoluminescence measurements; polarisation insensitive multi-quantum wells electroabsorption modulators; polarisation insensitivity; power saturation; quantum wells; quaternary compositions range; strain multiquantum well structure; valance band offset; Capacitive sensors; MOCVD; Optical fiber communication; Optical modulation; Optical polarization; Performance analysis; Photoconductivity; Photoluminescence; Photonic band gap; Power engineering and energy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on
  • Conference_Location
    Schwabisch-Gmund
  • Print_ISBN
    0-7803-3283-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1996.492020
  • Filename
    492020