DocumentCode
3371199
Title
Polarisation insensitive electroabsorption modulator with record power saturation using strained InGaAsP/InGaAsP/InAsP MQW structure
Author
Ougazzaden, A. ; Devaux, F.
Author_Institution
France Telcom, CNET, Bagneux, France
fYear
1996
fDate
21-25 Apr 1996
Firstpage
238
Lastpage
239
Abstract
Polarisation insensitive multi-quantum wells electroabsorption modulators becomes very attractive for optical communications, in particular for in line applications where the incident light polarisation is random. One key issue of the modulators remains their power saturation. The phenomenon cited as limiting power saturation is the accumulation of holes, in the quantum wells, which creates screening of applied field. To overcome this problem a low height barrier for holes is necessary to decrease the escape time of holes. In the InGaAsP system the relatively large valance band offset prevents a fast holes evacuation. Consequently the quaternary compositions range for wells and barriers which satisfied the two requirements, high power saturation and polarisation insensitivity, is very narrow. In this study we report a innovative design with strain multiquantum well structure InGaAsP/InGaAsP/InAsP giving high power saturation together with polarisation insensitivity. A careful analysis of the structure in terms of band gap engineering has been performed to fulfil the requirements. The growth has been performed by MOCVD at atmospheric pressure. The quality material assessed by photocurrent, DDX, TEM and photoluminescence measurements are presented
Keywords
III-V semiconductors; electro-optical modulation; electroabsorption; gallium arsenide; gallium compounds; indium compounds; optical communication equipment; optical fabrication; optical saturation; photoemission; photoluminescence; semiconductor heterojunctions; semiconductor quantum wells; transmission electron microscopy; vapour phase epitaxial growth; 1 atm; DDX measurements; InAsP; InGaAsP; InGaAsP-InGaAsP-InAsP; InGaAsP/InGaAsP/InAsP; MOCVD; MQW structure; TEM measurements; atmospheric pressure; band gap engineering; electroabsorption modulator; escape time; in line applications; low height barrier; photocurrent measurements; photoluminescence measurements; polarisation insensitive multi-quantum wells electroabsorption modulators; polarisation insensitivity; power saturation; quantum wells; quaternary compositions range; strain multiquantum well structure; valance band offset; Capacitive sensors; MOCVD; Optical fiber communication; Optical modulation; Optical polarization; Performance analysis; Photoconductivity; Photoluminescence; Photonic band gap; Power engineering and energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on
Conference_Location
Schwabisch-Gmund
Print_ISBN
0-7803-3283-0
Type
conf
DOI
10.1109/ICIPRM.1996.492020
Filename
492020
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