Title :
3D Silicon Betavoltaics Microfabricated using a Self-Aligned Process for 5 Milliwatt/CC Average, 5 Year Lifetime Microbatteries
Author :
Duggirala, Rajesh ; Tin, Steven ; Lal, Amit
Author_Institution :
Cornell Univ., Ithaca
Abstract :
We report on the first demonstration of high efficiency 3D silicon betavoltaics, microtextured with deep reactive ion etched (DRIE) trenches, for potential application in 5 year lifetime 5 mW / cc Promethium -147 powered microbatteries. Prototype 3D silicon betavoltaics were designed and microfabricated in a 2-mask self-aligned process, and characterized using accelerated electron beams in a scanning electron microscope to yield 1.02 % conversion efficiency @ 30 kV acceleration voltage.
Keywords :
cells (electric); micromechanical devices; sputter etching; 3D silicon betavoltaics microfabrication; deep reactive ion etched trenches; microbatteries; self-aligned process; Acceleration; Batteries; Electron beams; Etching; Fuels; Pacemakers; Radioactive materials; Silicon; Solid state circuits; Wireless sensor networks; 3D Betavoltaic; Microbattery; Promethium-147; Silicon;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
DOI :
10.1109/SENSOR.2007.4300123
