• DocumentCode
    3372425
  • Title

    Growth of dislocation free grade Fe doped InP crystals

  • Author

    Noda, Akira ; Nakamura, Masashi ; Arakawa, Atsutoshi ; Hirano, Ryuichi

  • Author_Institution
    Dept. of Compound Semicond. Mater., Nikko Mater. Co. Ltd., Ibaraki, Japan
  • fYear
    2004
  • fDate
    31 May-4 June 2004
  • Firstpage
    552
  • Lastpage
    553
  • Abstract
    3-inch Fe doped dislocation-free (DF) grade (dislocation density < 500 cm-2) InP crystals were grown by the phosphorus vapor controlled liquid-encapsulated Czochralski (PC-LEC) method. By controlling the solid/liquid (S/L) interface shape and reducing the axial temperature gradient, the dislocation density of 3-inch Fe doped InP crystals below 500 cm-2 was achieved for the whole ingot. The average dislocation density per a wafer was 100 cm-2 at lowest. The dislocation density of 4-inch Fe doped InP crystals was also reduced to less than 5 × 103 cm-2 by this method.
  • Keywords
    III-V semiconductors; crystal growth from melt; dislocations; indium compounds; ingots; iron; semiconductor growth; 3 inch; InP:Fe; dislocation density; ingot; phosphorus vapor controlled liquid-encapsulated Czochralski method; solid-liquid interface; Crystalline materials; Crystals; Etching; Indium phosphide; Iron; Photodetectors; Semiconductor materials; Shape control; Substrates; Temperature control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-8595-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2004.1442779
  • Filename
    1442779