Title :
Test-Pattern Grading and Pattern Selection for Small-Delay Defects
Author :
Yilmaz, Mahmut ; Chakrabarty, Krishnendu ; Tehranipoor, Mohammad
Author_Institution :
Dept. of Electr. & Comput. Eng., Duke Univ., Durham, NC
fDate :
April 27 2008-May 1 2008
Abstract :
Timing-related defects are becoming increasingly important in nanometer technology designs. Small delay variations induced by crosstalk, process variations, power-supply noise, as well as resistive opens and shorts can potentially cause timing failures in a design, thereby leading to quality and reliability concerns. We present a test-grading technique to leverage the method of output deviations for screening small-delay defects (SDDs). A new gate-delay defect probability measure is defined to model delay variations for nanometer technologies. The proposed technique intelligently selects the best set of patterns for SDD detection from an n-detect pattern set generated using timing-unaware automatic test-pattern generation (ATPG). It offers significantly lower computational complexity and it excites a larger number of long paths compared to previously proposed timing-aware ATPG methods. We show that, for the same pattern count, the selected patterns are more effective than timing-aware ATPG for detecting small delay defects caused by resistive shorts, resistive opens, and process variations.
Keywords :
automatic test pattern generation; computational complexity; integrated circuit reliability; nanotechnology; automatic test-pattern generation; computational complexity; nanometer technology designs; pattern selection; resistive opens; resistive shorts; small-delay defects; test-pattern grading; timing failures; Automatic test pattern generation; Benchmark testing; Circuit testing; Clocks; Contracts; Crosstalk; Delay effects; Integrated circuit technology; Test pattern generators; Timing; ATPG; Small-delay defects; pattern grading; pattern selection;
Conference_Titel :
VLSI Test Symposium, 2008. VTS 2008. 26th IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
978-0-7695-3123-6
DOI :
10.1109/VTS.2008.32