Title :
Color guided top down analysis on memory device
Author_Institution :
Infineon Technol. (Kulim) Sdn. Bhd., Kulim, Malaysia
Abstract :
The paper outlines top down polishing method to reveal ONO (Oxide-Nitride-Oxide) and AA (Active Area) abnormality of memory device. The sample preparation utilizes the advantage of polishing non-uniformity to create rainbow appearance on sample surface. Based on color appears on targets, analyst can anticipate upcoming layer accurately upon subsequent wet de-processing.
Keywords :
colour; polishing; semiconductor storage; wetting; AA abnormality; ONO; color guided top down analysis; memory device; oxide-nitride-oxide abnormality; polishing nonuniformity; rainbow appearance; sample preparation; subsequent wet deprocessing; top down polishing method; Etching; Image color analysis; Inspection; Optical microscopy; Scanning electron microscopy; Silicon;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2012 19th IEEE International Symposium on the
Conference_Location :
Singapore
Print_ISBN :
978-1-4673-0980-6
DOI :
10.1109/IPFA.2012.6306310
