DocumentCode
3373673
Title
Color guided top down analysis on memory device
Author
Yong Foo Khong
Author_Institution
Infineon Technol. (Kulim) Sdn. Bhd., Kulim, Malaysia
fYear
2012
fDate
2-6 July 2012
Firstpage
1
Lastpage
4
Abstract
The paper outlines top down polishing method to reveal ONO (Oxide-Nitride-Oxide) and AA (Active Area) abnormality of memory device. The sample preparation utilizes the advantage of polishing non-uniformity to create rainbow appearance on sample surface. Based on color appears on targets, analyst can anticipate upcoming layer accurately upon subsequent wet de-processing.
Keywords
colour; polishing; semiconductor storage; wetting; AA abnormality; ONO; color guided top down analysis; memory device; oxide-nitride-oxide abnormality; polishing nonuniformity; rainbow appearance; sample preparation; subsequent wet deprocessing; top down polishing method; Etching; Image color analysis; Inspection; Optical microscopy; Scanning electron microscopy; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits (IPFA), 2012 19th IEEE International Symposium on the
Conference_Location
Singapore
ISSN
1946-1542
Print_ISBN
978-1-4673-0980-6
Type
conf
DOI
10.1109/IPFA.2012.6306310
Filename
6306310
Link To Document