DocumentCode :
3373967
Title :
High Throughput Cell Electroporation Array Fabricated by Single-Mask Inclined UV Lithography Exposure and Oxygen Plasma Etching
Author :
Suzuki, Takaaki ; Yamamoto, Hideo ; Ohoka, Masataka ; Okonogi, Atsuhito ; Kabata, Hiroyuki ; Kanno, Isaku ; Washizu, Masao ; Kotera, Hidetoshi
fYear :
2007
fDate :
10-14 June 2007
Firstpage :
687
Lastpage :
690
Abstract :
In this paper, we propose a multiple cell treatment array with high-density arrayed micro-orifice having an individually accessible microchannel and electrodes. More than 10000 micro-orifices with the diameter of 2 mum can be simultaneously fabricated by Single-Mask inclined UV photolithography for embedded network (SIMPLE) process with the oxygen plasma etching. More than 200 living cells immobilized at the arrayed micro-orifices were permeabilized by electroporation and allowed to uptake an foreign impermeant substance.
Keywords :
biological techniques; cellular biophysics; electrodes; masks; microfluidics; sputter etching; ultraviolet lithography; electrodes; embedded network; high throughput cell electroporation array; high-density arrayed micro-orifice; individually accessible microchannel; living cells; multiple cell treatment array; oxygen plasma etching; single-mask inclined UV lithography exposure; single-mask inclined UV photolithography; Etching; Lithography; Microchannel; Orifices; Oxygen; Plasma applications; Rough surfaces; Sensor arrays; Surface morphology; Throughput; Electroporation; Inclined Lithography; Oxygen Plasma Etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
Type :
conf
DOI :
10.1109/SENSOR.2007.4300223
Filename :
4300223
Link To Document :
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