DocumentCode :
3374636
Title :
A robust and production worthy addressable array architecture for deep sub-micron MOSFET´s matching characterization
Author :
Yeo, S.B. ; Bordelon, J. ; Chu, S. ; Li, M.-F. ; Tranchina, B.A. ; Harward, M. ; Chan, L.H. ; See, A.
Author_Institution :
Nat. Univ. of Singapore, Singapore
fYear :
2002
fDate :
8-11 April 2002
Firstpage :
229
Lastpage :
234
Abstract :
A robust addressable array test structure is presented, which allows automated characterization of the MOSFET´s matching, with high area and time efficiency, accuracy and repeatability. It features CMOS switches to ensure a full test operation range, and prevent gate oxide breakdown of individual DUTs from destroying the functionality of the whole test structure. The test structure provides superior isolation to minimize cross talk while providing greater flexibility in testing. The testing result (Id mismatch) on wafers of 0.18 μm technology is presented.
Keywords :
CMOS integrated circuits; MOSFET; VLSI; arrays; integrated circuit testing; production testing; 0.18 micron; CMOS switches; MOSFET matching characterization; automated characterization; crosstalk minimization; deep submicron MOSFETs; gate oxide breakdown; manufacturing environment; production worthy addressable array architecture; robust addressable array architecture; test structure; volume test methodology; CMOS technology; Circuit testing; Electric breakdown; Kelvin; MOSFET circuits; Probes; Production; Robustness; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 2002. ICMTS 2002. Proceedings of the 2002 International Conference on
Print_ISBN :
0-7803-7464-9
Type :
conf
DOI :
10.1109/ICMTS.2002.1193201
Filename :
1193201
Link To Document :
بازگشت