DocumentCode :
3374841
Title :
The impact of lossy line propagation on large die
Author :
Davidson, Evan ; McCredie, Brad ; Vilkeiis, W.
Author_Institution :
IBM Corp., Poughkeepsie, NY, USA
fYear :
1995
fDate :
2-4 Oct 1995
Firstpage :
20
Abstract :
Contrary to popular opinion, smaller feature sizes are not always faster when it comes to designing large custom CMOS die. This is due to the fact that at and below 0.5 micron ground rules, metal line cross-sections are becoming so small that lossy line propagation performance degraders are becoming significant. This knowledge was garnered by analyzing a real microprocessor design and comparing this data with a theoretical wiring model. However, the use of a multi-chip die (MCD) rather than an oversized die can result in a significant cost-performance advantage for a large complex system function such as a microprocessor
Keywords :
CMOS digital integrated circuits; application specific integrated circuits; integrated circuit design; microprocessor chips; 0.5 micron; design; ground rules; large custom CMOS die; lossy line propagation; metal lines; microprocessor; multi-chip die; wiring model; CMOS process; Clocks; Degradation; Delay; Electronics packaging; Game theory; Microprocessors; Performance loss; Propagation losses; Wiring;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Performance of Electronic Packaging, 1995
Conference_Location :
Portland, OR
Print_ISBN :
0-7803-3034-X
Type :
conf
DOI :
10.1109/EPEP.1995.524682
Filename :
524682
Link To Document :
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