Novel Monocrystalline Silicon Micromirrors for Maskless Lithography

Author

Bring, M. ; Enoksson, P.

Author_Institution

Chalmers Univ. of Technol., Gothenburg

fYear

2007

fDate

10-14 June 2007

Firstpage

1083

Lastpage

1086

Abstract

A novel monocrystalline silicon micromirror structure for improving image fidelity in laser pattern generators is presented. Analytical- and finite element analysis of the structure as well as an outline of the fabrication scheme to realize the structure are given. Electrostatic actuated test-structures have been fabricated and characterized using an optical profiler. The spring constant of the micromirror structure can be designed independently of the stiffness of the mirror-surface. This makes it possible to design a mirror with very good planarity, resistance to sagging during actuation, and it reduces influence from stress in reflectivity-increasing multi-layer coatings.

Keywords

electrostatic actuators; finite element analysis; lithography; micromirrors; silicon; Si; electrostatic actuated test-structures; finite element analysis; image fidelity; laser pattern generators; maskless lithography; monocrystalline silicon micromirror structure; multilayer coatings; optical profiler; spring constant; Electrostatics; Finite element methods; Lithography; Micromirrors; Mirrors; Optical device fabrication; Silicon; Springs; Stress; Testing; electrostatic actuation; maskless lithography; micromirrors; transfer bonding;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International

Conference_Location

Lyon

Print_ISBN

1-4244-0842-3

Electronic_ISBN

1-4244-0842-3

Type

conf

DOI

10.1109/SENSOR.2007.4300322

Filename

4300322