Title :
Novel Monocrystalline Silicon Micromirrors for Maskless Lithography
Author :
Bring, M. ; Enoksson, P.
Author_Institution :
Chalmers Univ. of Technol., Gothenburg
Abstract :
A novel monocrystalline silicon micromirror structure for improving image fidelity in laser pattern generators is presented. Analytical- and finite element analysis of the structure as well as an outline of the fabrication scheme to realize the structure are given. Electrostatic actuated test-structures have been fabricated and characterized using an optical profiler. The spring constant of the micromirror structure can be designed independently of the stiffness of the mirror-surface. This makes it possible to design a mirror with very good planarity, resistance to sagging during actuation, and it reduces influence from stress in reflectivity-increasing multi-layer coatings.
Keywords :
electrostatic actuators; finite element analysis; lithography; micromirrors; silicon; Si; electrostatic actuated test-structures; finite element analysis; image fidelity; laser pattern generators; maskless lithography; monocrystalline silicon micromirror structure; multilayer coatings; optical profiler; spring constant; Electrostatics; Finite element methods; Lithography; Micromirrors; Mirrors; Optical device fabrication; Silicon; Springs; Stress; Testing; electrostatic actuation; maskless lithography; micromirrors; transfer bonding;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
DOI :
10.1109/SENSOR.2007.4300322
