DocumentCode
3376748
Title
Modeling the generation and dissociation of the boron-oxygen complex in B-Doped Cz-Si
Author
Lim, Bianca ; Bothe, Karsten ; Schmidt, Jan
Author_Institution
Institut fÿr Solarenergieforschung Hameln (ISFH), Am Ohrberg 1, 31860 Emmerthal, Germany
fYear
2008
fDate
11-16 May 2008
Firstpage
1
Lastpage
4
Abstract
We demonstrate that the boron-oxygen (Bs O2i ) recombination center responsible for the light-induced degradation of Czochralski silicon solar cells can be deactivated by simultaneous annealing and illumination. After applying this deactivation treatment the improved carrier lifetime is shown to be stable under illumination at room temperature. The measured dependence of the deactivation rate as a function of temperature indicates that the process is thermally activated. Based on the experimental findings a defect reaction model is proposed which attributes the deactivation to a dissociation reaction of a complex XY of unknown composition and to the subsequent association of one component X of this complex with the oxygen dimer O2i into XO2i , thereby reducing the concentration of unbound O2i . An excellent agreement between the experimental and the modeled time dependence of the Bs O2i concentration is found.
Keywords
Annealing; Charge carrier lifetime; Degradation; Lighting; Photovoltaic cells; Semiconductor device modeling; Silicon; Solar power generation; Temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location
San Diego, CA, USA
ISSN
0160-8371
Print_ISBN
978-1-4244-1640-0
Electronic_ISBN
0160-8371
Type
conf
DOI
10.1109/PVSC.2008.4922482
Filename
4922482
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