A Micromachined X-Ray Collector for Space Astronomy

Author

Ezoe, Y. ; Koshiishi, M. ; Mita, M. ; Maeda, Y. ; Mitsuda, K. ; Osawa, T. ; Suzuki, M. ; Hoshino, A. ; Ishisaki, Y. ; Takano, T. ; Maeda, R.

Author_Institution

Japan Aerosp. Exploration Agency, Sagamihara

fYear

2007

fDate

10-14 June 2007

Firstpage

1321

Lastpage

1324

Abstract

A novel micromachined X-ray collector using anisotropically etched Si (111) planes as X-ray mirrors for future astronomical missions is reported. Mirrors, fabricated using dynashock-type ultrasonic waves, have very smooth surfaces with an rms roughness of nm or less. After the etching, mirror chips were cut from the wafer with a dicing machine and adhered to a mount formed by deep reactive ion etching, in order to collect parallel X-ray beam (0100 mm) on a tiny focus (phi 4 mm). The first light image was successfully obtained at Al K_alpha 1.49 keV in a ISAS 30 m-long beam line.

Keywords

astronomy; micromachining; micromirrors; sputter etching; X-ray mirrors; anisotropically etched planes; deep reactive ion etching; micromachined X-ray collector; parallel X-ray beam; space astronomy; Anisotropic magnetoresistance; Astronomy; Focusing; Mirrors; Optical reflection; Optical surface waves; Silicon; Space technology; Wet etching; X-ray imaging; Anisotropic Wet Etching; Deep Reactive Ion Etching; Silicon (111) Planes; X-ray Collector;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International

Conference_Location

Lyon

Print_ISBN

1-4244-0842-3

Electronic_ISBN

1-4244-0842-3

Type

conf

DOI

10.1109/SENSOR.2007.4300383

Filename

4300383