DocumentCode :
3378018
Title :
Optofluidic Maskless Lithography System
Author :
Chung, Su E. ; Park, Wook ; Park, Hyunsung ; Yu, Kyoungsik ; Park, Namkyoo ; Kwon, Sunghoon
Author_Institution :
Seoul Nat. Univ., Seoul
fYear :
2007
fDate :
10-14 June 2007
Firstpage :
1569
Lastpage :
1572
Abstract :
We propose and demonstrate an optofluidic maskless lithography technique to fabricate various polymer microparticles and microwires in microfluidic channels. Combining maskless lithography and microfluidic systems, we demonstrate temporal and spatial control of polymeric micro structure generation in microfluidic channels.
Keywords :
lithography; microchannel flow; photolithography; polymers; microfluidic channels; microfluidic systems; microwires; optofluidic maskless lithography system; polymer microparticles; polymeric micro structure generation; spatial control; temporal control; Control systems; Lithography; Microfluidics; Micromechanical devices; Micromirrors; Microstructure; Optical modulation; Optical polymers; Shape control; Streaming media; Maskless lithography; Microfluidics; Optofluidics; Polymer bead;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
Type :
conf
DOI :
10.1109/SENSOR.2007.4300446
Filename :
4300446
Link To Document :
بازگشت