Title :
Diagonal MOSFETs characterization for 256M DRAM and beyond
Author :
Hu, Yin ; Teng, Clarence W. ; Coleman, Donald J., Jr. ; Richardson, William F. ; Liu, Jiann ; Ho, Chi-Chien ; Aur, Shian
Author_Institution :
Semicond. Process & Design Center, Texas Instrum. Inc., Dallas, TX, USA
fDate :
31 May-2 Jun 1995
Abstract :
A diagonal MOSFET structure has been designed, fabricated and characterized for 256M DRAM and other general applications. The effective W/L ratio is found to play a very important role in diagonal MOSFET´s characteristics because of its three dimensional current flow pattern. In general, the diagonal MOSFETs have lower drive current but Vt is less sensitive to the scaling in device channel length and width. Our experimental results show that Channel Hot Carrier (CHC) degradation of diagonal MOSFETs is similar to that of conventional MOSFETs, despite the current crowding effect in the diagonal MOSFETs
Keywords :
DRAM chips; MOS memory circuits; MOSFET; hot carriers; 256 Mbit; DRAMs; channel hot carrier degradation; current crowding; diagonal MOSFETs; drive current; three dimensional current flow; threshold voltage; width/length ratio; Capacitors; Degradation; Hot carriers; Instruments; MOSFETs; Proximity effect; Random access memory;
Conference_Titel :
VLSI Technology, Systems, and Applications, 1995. Proceedings of Technical Papers. 1995 International Symposium on
Conference_Location :
Taipei
Print_ISBN :
0-7803-2773-X
DOI :
10.1109/VTSA.1995.524709