DocumentCode
3378382
Title
A mathematical model for estimating defect inspection capacity with a dynamic control strategy
Author
Rodriguez-Verjan, Gloria Luz ; Dauzere-Peres, Stephane ; Pinaton, Jacques
Author_Institution
Dept. of Manuf. Sci. & Logistics, Ecole Nat. des Mines de St.-Etienne - CMP, Gardanne, France
fYear
2012
fDate
9-12 Dec. 2012
Firstpage
1
Lastpage
9
Abstract
In this paper, we introduce a mathematical model for estimating the use of defect inspection capacity. Until recently, the selection of lots to be inspected was only done at the beginning of the manufacturing process. With the introduction of dynamic controls on production tools, the selection of lots to be inspected is done according to the production state. Our problem focuses on the Wafer at Risk (W@R) on process tools. The W@R is the number of processed wafers between two control operations. The W@R depends on several factors such as the availability of measurable products, control limits, defect inspection capacity and defect inspection control plans of products. Our model aims at calculating the defect inspection capacity required for given values of the listed factors. Experimental results on actual factory data are presented and discussed.
Keywords
inspection; production control; semiconductor technology; defect inspection capacity; defect inspection control plan; dynamic control strategy; production tool; wafer at risk; Inspection; Manufacturing processes; Mathematical model; Process control; Resource management; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation Conference (WSC), Proceedings of the 2012 Winter
Conference_Location
Berlin
ISSN
0891-7736
Print_ISBN
978-1-4673-4779-2
Electronic_ISBN
0891-7736
Type
conf
DOI
10.1109/WSC.2012.6465305
Filename
6465305
Link To Document