DocumentCode :
3378642
Title :
Integration of MOSFET Transistors in MEMS Resonators for Improved Output Detection
Author :
Grogg, Daniel ; Tsamados, Dimitrios ; Badila, Nicoleta Diana ; Ionescu, Adrian Mihai
Author_Institution :
Ecole Polytech. Fed. de Lausanne, Lausanne
fYear :
2007
fDate :
10-14 June 2007
Firstpage :
1709
Lastpage :
1712
Abstract :
Micro-electromechanical (MEM) laterally vibrating square resonators and beams, fabricated via a prototyping technology combining FIB-micromachined gaps with conventional UV lithography in 1.35 mum thick SOI are presented. Resonators with both capacitive and MOSFET detection and gaps of ~100 nm are demonstrated. Resonance frequencies of 32 MHz and 13 MHz were measured for squares and beams, respectively. The square shaped resonators have Q-factors in the order of 4000. This paper reports on a vibrating body MOS transistor active detection scheme integrated in a MEMS fabrication process to improve the signal read out.
Keywords :
MOSFET; focused ion beam technology; frequency measurement; micromachining; micromechanical resonators; silicon-on-insulator; ultraviolet lithography; FIB-micromachined gaps; MEMS resonators; MOSFET transistors; Q-factors; SOI; UV lithography; beams; focused ion beam prototyping; frequency 13 MHz; frequency 32 MHz; laterally vibrating square resonators; microelectromechanical device; resonance frequency measurement; size 1.35 mum; Fabrication; Frequency measurement; Lithography; MOSFET circuits; Micromechanical devices; Prototypes; Q factor; Resonance; Resonant frequency; Vibrations; FIB milling; MEM resonator; MOSFET detection; Micromachining;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
Type :
conf
DOI :
10.1109/SENSOR.2007.4300481
Filename :
4300481
Link To Document :
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