DocumentCode :
3379463
Title :
The improvement of I-V characteristics curve fitting by the modification of SPICE model-level 3
Author :
Chung-Zen Chen
Author_Institution :
Ind. Technol. Res. Inst., Electron. Res. & Service Organ., Hsin-Chu
fYear :
1991
fDate :
22-24 May 1991
Firstpage :
278
Lastpage :
282
Abstract :
The semi-empirical SPICE model-level 3 is obviously improved by treating the effective electrical channel length Leff and source-drain external resistance RSD as bias-dependent in the lightly-doped-drain MOSFET devices. The universal surface mobility model: μs0/(1+θ(VGS-VTH )) is proved again, i.e., the parameters θ and μ0 are the same for different channel length devices. On the other hand, the saturation velocity υs is treated as an empirical parameter. Through these improvements: bias-dependent Leff, RSD, and remodeled υs, the model becomes more suitable to fit the I-V characteristics of devices with large range of device channel length using a single set of device parameters
Keywords :
SPICE; carrier mobility; curve fitting; electronic engineering computing; insulated gate field effect transistors; semiconductor device models; I-V characteristics; I-V characteristics curve fitting; SPICE model; device parameters; effective electrical channel length; lightly-doped-drain MOSFET devices; saturation velocity; source-drain external resistance; universal surface mobility model; CMOS process; Curve fitting; Electric resistance; Electronics industry; Intrusion detection; MOSFET circuits; SPICE; Semiconductor device modeling; Surface fitting; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems, and Applications, 1991. Proceedings of Technical Papers, 1991 International Symposium on
Conference_Location :
Taipei
ISSN :
1524-766X
Print_ISBN :
0-7803-0036-X
Type :
conf
DOI :
10.1109/VTSA.1991.246665
Filename :
246665
Link To Document :
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