DocumentCode
3379508
Title
Microanalysis for tin whisker risk assessment
Author
Mason, Maribeth ; Eng, Genghmun ; Leung, Martin ; Stupian, Gary ; Yeoh, Terence
Author_Institution
Microelectron. Technol. Dept., Aerosp. Corp., El Segundo, CA, USA
fYear
2011
fDate
10-14 April 2011
Abstract
We use microanalysis to illustrate several effects of plating microstructure on tin whisker growth, such as grain size, plating composition, and plating thickness. Starting from the diffusion-based theory of tin whisker growth, we explain why large-grained and thin platings grow fewer whiskers, and why Ni diffusion barriers and Sn-3% Pb solder composition may not be protective against tin whisker growth. We also use tin whisker growth rate data to quantify the diffusion model and predict the time evolution of whisker length distributions. The results provide a consistent framework for tin whisker risk assessment from a materials perspective.
Keywords
X-ray chemical analysis; grain size; tin; whiskers (crystal); EDX; Sn; X-ray chemical analysis; diffusion-based theory; grain size; plating microstructure composition; plating thickness; solder composition; tin whisker risk assessment microanalysis; whisker length distributions; Copper; Grain boundaries; Impurities; Lead; Microstructure; Nickel; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium (IRPS), 2011 IEEE International
Conference_Location
Monterey, CA
ISSN
1541-7026
Print_ISBN
978-1-4244-9113-1
Electronic_ISBN
1541-7026
Type
conf
DOI
10.1109/IRPS.2011.5784473
Filename
5784473
Link To Document