DocumentCode :
3379850
Title :
VLSI/ULSI research methodology in the US and Japan
Author :
Nishi, Yoshio
Author_Institution :
Silicon Process Lab., Hewlett-Packard, Palo Alto, CA, USA
fYear :
1991
fDate :
22-24 May 1991
Firstpage :
187
Lastpage :
190
Abstract :
When one looks at the US-Japan science and technology relationship in general, there are a number of possible viewpoints from which to approach the issue of mutual concerns. It has been said that interactions between the US and Japan have not been bilateral with respect to basic research and product development/manufacturing. The former area has had a strong unilateral flow of knowledge from the US to Japan, while the latter area has been characterized by a significant trade imbalance in industrial products. Japanese efficiency in product manufacturing versus US superiority in basic research is a topic often discussed. However, once one takes a much closer look at the mechanism and methodology of research and development, one may reach a deeper understanding of what has led to today´s situation, and, at the same time, get some hint as to how one could improve it in the future
Keywords :
VLSI; electronics industry; research and development management; research initiatives; DRAM technology; Japan; RISC processor architecture concept; ULSI; USA; VLSI; industry-university interaction; product development/manufacturing; research methodology; trade imbalance; Chemical technology; Chemistry; Manufacturing processes; Physics; Prototypes; Random access memory; Research and development; Silicon; Ultra large scale integration; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems, and Applications, 1991. Proceedings of Technical Papers, 1991 International Symposium on
Conference_Location :
Taipei
ISSN :
1524-766X
Print_ISBN :
0-7803-0036-X
Type :
conf
DOI :
10.1109/VTSA.1991.246685
Filename :
246685
Link To Document :
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