Title :
An integrated technology CAD environment
Author :
Fasching, F. ; Fischer, C. ; Halama, S. ; Pimingstorfer, H. ; Read, H. ; Selberherr, S. ; Stippel, H. ; Verhas, P. ; Wimmer, K.
Author_Institution :
Inst. for Microelectron., Tech. Univ. of Vienna, Austria
Abstract :
A new TCAD system is presented, capable of performing complex development tasks by means of a powerful interaction language and an efficient database system. The integration of tools is supported through a comfortable layered application program interface
Keywords :
circuit CAD; project support environments; semiconductor process modelling; LISP interpreter; complex development tasks; efficient database system; integrated technology CAD environment; integration of tools; interaction language; layered application program interface; Control systems; Data engineering; Data structures; Database systems; Distributed processing; Joining processes; Microelectronics; Voice mail; Writing;
Conference_Titel :
VLSI Technology, Systems, and Applications, 1991. Proceedings of Technical Papers, 1991 International Symposium on
Conference_Location :
Taipei
Print_ISBN :
0-7803-0036-X
DOI :
10.1109/VTSA.1991.246693
