DocumentCode
3380134
Title
Analysis of NBTI-induced SNM degradation in power-gated SRAM cells
Author
Calimera, Andrea ; Macii, Enrico ; Poncino, Massimo
Author_Institution
Politec. di Torino, Torino, Italy
fYear
2010
fDate
May 30 2010-June 2 2010
Firstpage
785
Lastpage
788
Abstract
Temporal reliability degradation mechanism, and NBTI in particular, are especially critical for SRAM cells. In fact, unlike logic gates, which under some conditions can be forced into an NBTI-immune state, SRAM cells are always subject to aging, whatever value they are storing. In this work, we first quantify the aging, in terms of degradation of the signal-to-noise margin (SNM), of an SRAM cell as a function of the value stored in the cell, on a 45nm industrial technology. Then, we show how it is possible, by applying power gating to the memory cell, to further reduce the SNM degradation. Finally, we study the joint effect of power gating and bit control techniques.
Keywords
SRAM chips; nanoelectronics; semiconductor device reliability; NBTI-induced SNM degradation; SNM degradation; SRAM aging quantification; bit control techniques; industrial technology; memory cell; negative bias temperature instability; power-gated SRAM cells; signal-to-noise margin; size 45 nm; temporal reliability degradation mechanism; Aging; CMOS technology; Degradation; Delay effects; Niobium compounds; Random access memory; Statistics; Stress; Threshold voltage; Titanium compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Circuits and Systems (ISCAS), Proceedings of 2010 IEEE International Symposium on
Conference_Location
Paris
Print_ISBN
978-1-4244-5308-5
Electronic_ISBN
978-1-4244-5309-2
Type
conf
DOI
10.1109/ISCAS.2010.5537452
Filename
5537452
Link To Document