• DocumentCode
    3380134
  • Title

    Analysis of NBTI-induced SNM degradation in power-gated SRAM cells

  • Author

    Calimera, Andrea ; Macii, Enrico ; Poncino, Massimo

  • Author_Institution
    Politec. di Torino, Torino, Italy
  • fYear
    2010
  • fDate
    May 30 2010-June 2 2010
  • Firstpage
    785
  • Lastpage
    788
  • Abstract
    Temporal reliability degradation mechanism, and NBTI in particular, are especially critical for SRAM cells. In fact, unlike logic gates, which under some conditions can be forced into an NBTI-immune state, SRAM cells are always subject to aging, whatever value they are storing. In this work, we first quantify the aging, in terms of degradation of the signal-to-noise margin (SNM), of an SRAM cell as a function of the value stored in the cell, on a 45nm industrial technology. Then, we show how it is possible, by applying power gating to the memory cell, to further reduce the SNM degradation. Finally, we study the joint effect of power gating and bit control techniques.
  • Keywords
    SRAM chips; nanoelectronics; semiconductor device reliability; NBTI-induced SNM degradation; SNM degradation; SRAM aging quantification; bit control techniques; industrial technology; memory cell; negative bias temperature instability; power-gated SRAM cells; signal-to-noise margin; size 45 nm; temporal reliability degradation mechanism; Aging; CMOS technology; Degradation; Delay effects; Niobium compounds; Random access memory; Statistics; Stress; Threshold voltage; Titanium compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems (ISCAS), Proceedings of 2010 IEEE International Symposium on
  • Conference_Location
    Paris
  • Print_ISBN
    978-1-4244-5308-5
  • Electronic_ISBN
    978-1-4244-5309-2
  • Type

    conf

  • DOI
    10.1109/ISCAS.2010.5537452
  • Filename
    5537452