DocumentCode :
3380134
Title :
Analysis of NBTI-induced SNM degradation in power-gated SRAM cells
Author :
Calimera, Andrea ; Macii, Enrico ; Poncino, Massimo
Author_Institution :
Politec. di Torino, Torino, Italy
fYear :
2010
fDate :
May 30 2010-June 2 2010
Firstpage :
785
Lastpage :
788
Abstract :
Temporal reliability degradation mechanism, and NBTI in particular, are especially critical for SRAM cells. In fact, unlike logic gates, which under some conditions can be forced into an NBTI-immune state, SRAM cells are always subject to aging, whatever value they are storing. In this work, we first quantify the aging, in terms of degradation of the signal-to-noise margin (SNM), of an SRAM cell as a function of the value stored in the cell, on a 45nm industrial technology. Then, we show how it is possible, by applying power gating to the memory cell, to further reduce the SNM degradation. Finally, we study the joint effect of power gating and bit control techniques.
Keywords :
SRAM chips; nanoelectronics; semiconductor device reliability; NBTI-induced SNM degradation; SNM degradation; SRAM aging quantification; bit control techniques; industrial technology; memory cell; negative bias temperature instability; power-gated SRAM cells; signal-to-noise margin; size 45 nm; temporal reliability degradation mechanism; Aging; CMOS technology; Degradation; Delay effects; Niobium compounds; Random access memory; Statistics; Stress; Threshold voltage; Titanium compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems (ISCAS), Proceedings of 2010 IEEE International Symposium on
Conference_Location :
Paris
Print_ISBN :
978-1-4244-5308-5
Electronic_ISBN :
978-1-4244-5309-2
Type :
conf
DOI :
10.1109/ISCAS.2010.5537452
Filename :
5537452
Link To Document :
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