DocumentCode :
3380580
Title :
Thru-Wafer Interconnect for SOI-MEMS 3D Wafer-Level Hermetic Packaging
Author :
Lin, Chiung-Wen ; Yang, Hsueh-An ; Wang, Wei Chung ; Fang, Weileun
Author_Institution :
Nat. Tsing Hua Univ., Hsinchu
fYear :
2007
fDate :
10-14 June 2007
Firstpage :
2111
Lastpage :
2114
Abstract :
This research reports a packaging approach for SOI-MEMS devices using through-wafer vias and anodic bonding technologies. Through-wafer vias are embedded inside the SOI wafers, and are realized using laser drilling and electroplating. These vias provide electrical signal paths to MEMS device, whereas isolate MEMS devices from outer environment. A high-strength hermetic sealing is then achieved after anodic bonding of this through-wafer vias embedded SOI wafer to a Pyrex 7740 glass. Moreover, the packaged SOI-MEMS chip is compatible with the surface mount technology, and performs a superior way for 3D heterogeneous integration.
Keywords :
chip scale packaging; electroplating; hermetic seals; integrated circuit interconnections; laser beam machining; micromechanical devices; silicon-on-insulator; wafer bonding; wafer level packaging; wafer-scale integration; 3D heterogeneous integration; MEMS device; Pyrex 7740 glass; SOI-MEMS chip; anodic bonding technology; electroplating; laser drilling; through-wafer vias technology; wafer-level hermetic packaging; Drilling; Glass; Microelectromechanical devices; Micromechanical devices; Scanning electron microscopy; Semiconductor device packaging; Silicon on insulator technology; Surface-mount technology; Wafer bonding; Wafer scale integration; MEMS packaging; Through-wafer vias; heterogeneous integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
Type :
conf
DOI :
10.1109/SENSOR.2007.4300582
Filename :
4300582
Link To Document :
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